Gas Analyzer – Transpector CPX – 200 AMU

  • AI and Machine Learning driven solutions for smarter sensors and enhanced process control
  • Optimized WIP scheduling through advanced analytics
  • Residual gas analysis with high sensitivity and detection limits
  • Integration with FabGuard software for advanced process monitoring and diagnostics
  • High-speed data collection with 1.8 milliseconds per data point

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The Transpector CPX Residual Gas Analyzer is a compact, advanced process monitoring system designed for semiconductor manufacturing, offering industry-leading measurement speed and sensitivity. It provides real-time monitoring of atomic layer processes, detects undesirable variance, and ensures maximum uptime with features like an optional dual-filament ion source, configurable HexBlock, and corrosion-resistant capacitance diaphragm gauge. It integrates with FabGuard software for advanced process control, fault detection, and data analysis, making it versatile for applications such as 300 mm wafer degas, atomic layer deposition, etch processes, and chemical vapor deposition. The system is designed with a 30% smaller footprint compared to previous generations, enhancing ease of integration and reliability in space-constrained environments.

Use Cases

  • 300 mm Wafer Degas
  • Advanced Processes including Atomic Layer Deposition (ALD)
  • Etch Processes including metal, dielectric, silicon etch, and high-density plasma etch
  • Chemical Vapor Deposition (CVD) Processes including high-k dielectrics, HDP-CVD, LP-CVD, SA-CVD, CVD low-k, PE-CVD
  • Diffusion and Epitaxy Processes
  • Ion Implantation
  • Advanced process control (endpoint detection)
  • Run-by-run and real-time fault detection and classification
  • Statistical process control (SPC)
  • Maintenance and decision support with FabRecover
  • Typically used in hydrogen and related industrial applications

Capabilities

  • Industry-leading measurement speed and sensitivity
  • Detects undesirable variance in atomic layer processes
  • Fastest RGA process monitor available
  • Maximum uptime with innovative inlet and ion source feature options
  • Smaller Fab Footprint (30% reduction in system volume)
  • Optional Dual Filament Ion Source for extended lifetime
  • Configurable HexBlock with up to three pressure inlets
  • Corrosion Resistant Capacitance Diaphragm Gauge (CDG)
  • Automated Calibration for long-term data stability and accuracy
  • Process Integration with FabGuard® software and INFICON experts
  • Fast data collection speed up to 1.8 milliseconds per data point
  • Field-proven HexBlock inlet system adaptable to up to three process pressures
  • Corrosion resistant process pressure gauge for long life
  • Low-noise, high-gain continuous dynode electron multiplier
  • High-performance pumping platform with fast pumping and reduced footprint
INFICON

INFICON is a leading provider of advanced instrumentation for hydrogen detection, crucial for the hydrogen economy. They specialize in low-concentration hydrogen leak detection, supporting the transition to a fossil-free future. Their technology is vital for industries aiming for net-zero greenhouse gas goals.

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